Company
NetherlandsVeldhoven (HQ)
Lithography equipment company based in Veldhoven, the Netherlands, that publishes EUV and High-NA EUV system information used in advanced chip manufacturing.
3
Technologies
1
Technology Areas
2
Applications
Netherlands
Headquarters
Key technologies and platforms from this organization.
ASML TWINSCAN DUV is the deep-ultraviolet lithography platform covering immersion and dry scanners that print most chip layers alongside EUV. Distinct from NXE and High-NA EXE EUV.
AI & HPCConsumer ElectronicsView Details
ASML TWINSCAN NXE is the 0.33 numerical-aperture EUV lithography platform used in high-volume manufacturing of advanced logic and memory chips. Distinct from High-NA EXE systems.
AI & HPCConsumer ElectronicsView Details
ASML High-NA EUV lithography platform (TWINSCAN EXE) using 0.55 numerical aperture optics. Distinct from 0.33 NA TWINSCAN NXE EUV systems.
AI & HPCConsumer ElectronicsView DetailsKey focus areas and application domains for this organization.
Key themes and trends derived from the published technologies of this organization on Silicon Showcase.
3 published technologies in Manufacturing Equipment.
Published technologies associated with AI & HPC and Consumer Electronics.
